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Vacuum tube furnace
  • TF1200 Vacuum tube furnace
    TF1200 Vacuum tube furnace
    1200 ℃ tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific research instit
    Date：2023-05-22Model：TF1200Visits：559
  • TF1400 Vacuum tube furnace
    TF1400 Vacuum tube furnace
    1400 ℃ tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific research instit
    Date：2023-05-22Model：TF1400Visits：479
  • TF1700 Vacuum tube furnace
    1700℃ single-zone tube furnace is used in sintering and high temperature heat treatment of metal materials, ceramic materials, nano materials, semiconductor materials, powder metallurgy and other new materials in colleges and universities, scientific rese
    Date：2023-05-22Model：TF1700Visits：492
  • TF1200 ℃ CVD Tube Furnace
    TF1200 ℃ CVD Tube Furnace
    1200°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo
    Date：2023-05-23Model：TF1200 CVDVisits：423
  • TF1400 ℃ CVD Tube Furnace
    TF1400 ℃ CVD Tube Furnace
    1400°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo
    Date：2023-05-23Model：TF1400 ℃ CVDVisits：388
  • TF1700 ℃ CVD Tube Furnace
    TF1700 ℃ CVD Tube Furnace
    1700°C Tube Furnace Chemical Vapor Deposition (CVD) refers to the method of chemical gas or steam reacting on the surface of the substrate to synthesize coatings or nanomaterials. It is the most widely used technology in the semiconductor industry to depo
    Date：2023-05-23Model：TF1700 ℃ CVDVisits：406
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